FotoCreativaBA LAUNCHES TWO INTERNATIONAL OPEN CALLS IN EXPANDED PHOTOGRAPHY IN JAPAN AND CHINA
The Buenos Aires-based platform opens two simultaneous artist residency programs: one in collaboration with IDEA R LAB in Kurashiki and another with OrganHaus in Chongqing.
FotoCreativaBA, a platform dedicated to education, production, and research in expanded photography and contemporary art, currently has two international artist residency programs open to visual artists, photographers, and researchers from anywhere in the world.
The first is the Japan Residency, developed in collaboration with IDEA R LAB, a space directed by Hiroko Ohtsuki in Kurashiki. The program combines a twelve-month online laboratory (March 2027 – February 2028) with a one-month on-site residency in Kurashiki during March, April, or May 2028. The online phase includes a monthly theoretical and creative trigger connecting expanded photography with Japanese aesthetics — Wabi-Sabi, Kintsugi, the Ma interval, the Provoke movement — alongside individual curatorial mentorship with Natheim, program director, and group sessions with guest artists. The on-site phase is conceived as a space for context-based exploration, material investigation with local industrial waste, and dialogue with the Kurashiki community. The program includes shared facilities and accommodation; airfare and materials are not covered. The application deadline is December 30, 2026.
The second is the China Residency, in collaboration with OrganHaus, a non-profit independent art organization based at the Beiyuan Glass Factory in Beibei, Chongqing. The program combines twelve months of online curatorial training (September 2026 – August 2027) with a one-month on-site residency in Chongqing, distributed in flexible cohorts of three or four artists throughout 2027–2028. The residency includes shared studio space, accommodation, support from the OrganHaus team, and connection with the local artistic community. Airfare, visa, insurance, and personal expenses are not covered. The application deadline is August 15, 2026.
Both programs are bilingual (Spanish/English) and are open to artists interested in expanded photography, interdisciplinary practices, and transcultural dialogue. Inquiries and applications at hola@fotocreativaba.com.
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